CLTX 4410 - Apparel Design II (3)
Prerequisites: CLTX 2410 and CLTX 2510 . An advance course in flat pattern development, draping, drafting, and computer design drawings and techniques. Experimentation with a sloper, draping, use of computer drawings, and drafting from body measurements will produce original apparel designs. Laboratory required.
Click here for the Fall 2019 Class Schedule